The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 12, 2024
Filed:
Mar. 03, 2021
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Ilse Van Weperen, Son en Breugel, NL;
Han-Kwang Nienhuys, Utrecht, NL;
Teis Johan Coenen, Vught, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G01B 11/27 (2006.01); G01B 15/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/7085 (2013.01); G01B 11/27 (2013.01); G01B 15/00 (2013.01); G03F 7/70633 (2013.01);
Abstract
Methods and apparatus for determining a parameter of a structure fabricated in or on a substrate and compensated for a drift error. The methods comprising: illuminating, at a plurality of times, at least part of the structure with electromagnetic radiation, the at least part of the structure being at a first orientation; sensing, at the plurality of times, a plurality of average reflectances of the at least part of the structure; and determining, based on the plurality of average reflectances, an estimation of the parameter at one or more further times.