Mária Péter

USPTO Granted Patents = 28 (Patent Applications = 3)

CIPO Patents = 1 (Patent Applications = 2)

EPO Patents = 5 (Patent Applications = 1)

Average Co-Inventor Count = 7.9

ph-index = 4

Forward Citations = 55(Granted Patents)

Location History:

Veldhoven, NL (2022)
Eindhoven, NL (2011 - 2024)

Company Filing History:

24 out of 4,883

Asml Netherlands B.v.

patents

4 out of 1,005

Nederlandse Organisatie Voor Toegepast-natuurwetenschappelijk Onderzoek Tno

where one patent can have more than one assignee

Years Active: 2011-2025

Loading Chart...

28 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 12474629 - Membrane for EUV lithography (2025-11-18),

2. 12298663 - Method of manufacturing a pellicle for a lithographic apparatus, a pellicle for a lithographic apparatus, a lithographic apparatus, a device manufacturing method, an apparatus for processing a pellicle, and a method for processing a pellicle (2025-05-13),

3. 12117726 - Pellicle and pellicle assembly (2024-10-15),

4. 12066758 - Pellicle and pellicle assembly (2024-08-20),

5. 11971654 - Metal-silicide-nitridation for stress reduction (2024-04-30),

6. 11947256 - Simultaneous double-side coating of multilayer graphene pellicle by local thermal processing (2024-04-02),

7. 11762281 - Membrane for EUV lithography (2023-09-19),

8. 11754918 - Pellicle and pellicle assembly (2023-09-12),

9. 11686997 - Metal-silicide-nitridation for stress reduction (2023-06-27),

10. 11467486 - Graphene pellicle lithographic apparatus (2022-10-11),

11. 11347142 - Pellicle and pellicle assembly (2022-05-31),

12. 11320731 - Membrane for EUV lithography (2022-05-03),

13. 11314163 - Pellicle frame and pellicle assembly (2022-04-26),

14. 11287737 - Metal-silicide-nitridation for stress reduction (2022-03-29),

15. 11231646 - Pellicle and pellicle assembly (2022-01-25),

Title: Spotlight on Inventor Mária Péter: Revolutionizing Lithographic Apparatus Technology

Introduction:

In the buzzing tech hub of Eindhoven, NL, inventor Mária Péter has been making waves with his groundbreaking innovations in lithographic apparatus technology. With an impressive portfolio of 19 patents to his name, Péter's contributions have reshaped the industry landscape.

Latest Patents:

Péter's most recent patents showcase his expertise in metal-silicide-nitridation for stress reduction and simultaneous double-side coating of multilayer graphene pellicle. These patents introduce cutting-edge methods for manufacturing pellicles with enhanced performance in lithographic apparatus, revolutionizing the way these devices function.

Career Highlights:

During his illustrious career, Péter has left his mark on renowned companies such as ASML Netherlands B.V. and ASML Holding N.V. His innovative spirit and technical acumen have been instrumental in driving forward the development of lithographic apparatus technology, propelling the industry towards new heights of efficiency and precision.

Collaborations:

Péter has had the privilege of collaborating with top-tier professionals in the field, including esteemed coworkers Pieter-Jan Van Zwol and David Ferdinand Vles. Together, they have leveraged their collective expertise to push the boundaries of innovation and bring groundbreaking ideas to fruition.

Conclusion:

Inventor Mária Péter's relentless pursuit of innovation and excellence has cemented his legacy as a trailblazer in the realm of lithographic apparatus technology. His visionary patents and collaborative efforts stand as a testament to his enduring impact on the industry, inspiring the next generation of inventors to push the boundaries of what is possible.

This text is generated by artificial intelligence and may not be accurate.