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For the Inventor, By the Inventor

Eindhoven, Netherlands

Giovanni Luca Gattobigio

This inventor holds 26 USPTO granted patents and 5 published patent applications and 3 EPO patents, primarily in Lithography Apparatus. Top assignee: Asml Netherlands B.v.. Active years: 2018-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Giovanni Luca Gattobigio. Retrieved from https://idiyas.com/inventor/giovanni-luca-gattobigio

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 26 

% Patents Active = 96.2

 

Average Co-Inventor Count = 7.2

ph-index = 2

Forward Citations = 10(Granted Patents)


Company Filing History:

goldMedal26 out of 5,076 
 
Asml Netherlands B.v.
 patents

Years Active: 2018-2026

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Areas of Expertise:
Fluid Handling Structure
Lithographic Apparatus
Device Manufacturing Method
Inspection Method
Substrate Table
Performance Testing
Cleaning Device
Immersion Liquid
Manufacturing Device
Process Tool
26 patents (USPTO):Explore Patents
1. 12566382 - Fluid handling system, method and lithographic apparatus (2026-03-03),
2. 12529964 - Fluid handling system, method and lithographic apparatus (2026-01-20),
3. 12429778 - Fluid handling system, method and lithographic apparatus (2025-09-30),
4. 12242200 - Lithography apparatus and a method of manufacturing a device (2025-03-04),
5. 11860546 - Fluid handling structure for lithographic apparatus (2024-01-02),
6. 11809086 - Fluid handling structure, a lithographic apparatus, a method of using a fluid handling structure and a method of using a lithographic apparatus (2023-11-07),
7. 11774857 - Lithography apparatus and device manufacturing method (2023-10-03),
8. 11720032 - Process tool and an inspection method (2023-08-08),
9. 11614689 - Fluid handling structure and lithographic apparatus (2023-03-28),
10. 11454892 - Fluid handling structure for lithographic apparatus (2022-09-27),
11. 11372339 - Device manufacturing method and computer program (2022-06-28),
12. 11372336 - Lithography apparatus and device manufacturing method (2022-06-28),
13. 11231653 - Fluid handling structure and lithographic apparatus (2022-01-25),
14. 11156921 - Fluid handling structure, lithographic apparatus, and method of using a fluid handling structure (2021-10-26),
15. 11143969 - Method of performance testing working parameters of a fluid handling structure and a method of detecting loss of immersion liquid from a fluid handing structure in an immersion lithographic apparatus (2021-10-12),

Title: Giovanni Luca Gattobigio: A Trailblazer in Innovation

Introduction: Giovanni Luca Gattobigio, a remarkable inventor based in Eindhoven, NL, is renowned for his relentless pursuit of innovation and dedication to pushing the boundaries of technology. With 22 patents to his name, his work continues to inspire and drive progress in the ever-evolving landscape of innovation.

Latest Patents: Among his latest patents is a groundbreaking fluid handling structure for lithographic apparatus. This structure, designed for a lithographic apparatus, showcases Gattobigio's ingenuity in optimizing fluid flow and extraction for enhanced performance.

Career Highlights: Gattobigio's career is highlighted by his exceptional work at ASML Netherlands B.V., a leading technology company in the field of lithography. His contributions have played a significant role in advancing the capabilities of lithographic equipment, enabling heightened precision and efficiency in semiconductor manufacturing processes.

Collaborations: Throughout his career, Gattobigio has collaborated closely with esteemed colleagues such as Theodorus Wilhelmus Polet and Erik Henricus Egidius Catharina Eummelen. Together, they have fostered a culture of innovation and excellence, driving forward groundbreaking developments in the field of lithography.

Conclusion: In conclusion, Giovanni Luca Gattobigio stands as a true pioneer in the realm of inventions, with his groundbreaking work continuing to shape the future of technology. His relentless pursuit of innovation and collaborative spirit exemplify the ethos of progress and excellence in the ever-evolving landscape of technological advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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