The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 03, 2026
Filed:
Nov. 25, 2021
Asml Netherlands B.v., Veldhoven, NL;
Christianus Wilhelmus Johannes Berendsen, Veldhoven, NL;
Theodorus Wilhelmus Polet, Geldrop, NL;
Erik Henricus Egidius Catharina Eummelen, Veldhoven, NL;
Giovanni Luca Gattobigio, Eindhoven, NL;
Koen Cuypers, Lommel, BE;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A fluid handling system for a lithographic apparatus, wherein the fluid handling system is configured to confine immersion liquid to a liquid confinement space between a part of a projection system and a surface of a substrate in the lithographic apparatus so that a radiation beam projected from the projection system can irradiate the surface of the substrate by passing through the immersion liquid, the fluid handling system including a replaceable plate with an outer surface that includes a plurality of fluid openings configured for supply and/or extraction of immersion liquid and/or gas in a channel between the fluid handling system and the substrate, wherein the outer surface is coated.