The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 28, 2022
Filed:
Feb. 27, 2020
Asml Netherlands B.v., Veldhoven, NL;
Giovanni Luca Gattobigio, Eindhoven, NL;
Pieter Jeroen Johan Emanuel Hoefnagels, Eindhoven, NL;
Ronald Frank Kox, Peer, BE;
Marcus Johannes Van Der Zanden, Boekel, NL;
Maarten Marinus Van Oene, Waalwijk, NL;
Jorge Alberto Vieyra Salas, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A device manufacturing method using a lithographic apparatus having a localized immersion system for confining an immersion liquid to a space between a projection system and a substrate to be exposed by the projection system, the method including: predicting a set of first locations on the substrate having a risk of residual liquid from the immersion system when exposed using an initial route for a substrate to expose a plurality of fields thereon; determining a set of modifications to the initial route to reduce the risk of residual loss; test exposing at least one test substrate using the initial route; obtaining a set of second locations of defects in the exposed test substrate; selecting a subset of the set of modifications by comparing the first locations and the second locations; and exposing a plurality of production substrates using the initial route modified by the selected subset of modifications.