The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 28, 2022
Filed:
Nov. 01, 2017
Asml Netherlands B.v., Veldhoven, NL;
Erik Henricus Egidius Catharina Eummelen, Veldhoven, NL;
Frank Debougnoux, Voeren, BE;
Koen Cuypers, Lommel, BE;
Han Henricus Aldegonda Lempens, Weert, NL;
Theodorus Wilhelmus Polet, Geldrop, NL;
Jorge Alberto Vieyra Salas, Eindhoven, NL;
John Maria Bombeeck, Eindhoven, NL;
Johannes Cornelis Paulus Melman, Oisterwijk, NL;
Giovanni Luca Gattobigio, Eindhoven, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
An immersion lithography apparatus controller configured to control a positioner to move a support table to follow an exposure route and to control a liquid confinement structure, the controller configured to: predict whether liquid will be lost from an immersion space during at least one motion of the route in which an edge of the object passes under an edge of the immersion space, and if liquid loss from the immersion space is predicted, modify the fluid flow such that a first fluid flow rate into or out of an opening at a leading edge of the liquid confinement structure is different to a second fluid flow rate into or out of an opening at a trailing edge of the liquid confinement structure during the motion of predicted liquid loss or a motion of the route subsequent to the motion of predicted liquid loss.