The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 12, 2021
Filed:
Mar. 09, 2018
Asml Netherlands B.v., Veldhoven, NL;
Giovanni Luca Gattobigio, Eindhoven, NL;
Nirupam Banerjee, Eindhoven, NL;
Johan Franciscus Maria Beckers, Veldhoven, NL;
Erik Henricus Egidius Catharina Eummelen, Veldhoven, NL;
Ronald Frank Kox, Peer, BE;
Theodorus Wilhelmus Polet, Geldrop, NL;
Cornelius Maria Rops, Waalre, NL;
Mike Paulus Johannes Van Gils, Boxtel, NL;
Wouterus Jozephus Johannes Van Sluisveld, Best, NL;
Rik Vangheluwe, Bergeijk, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method of performance testing working parameters of a fluid handing structure in an immersion lithographic apparatus, the method including: placing a test substrate having an upper surface with a first portion with a resist defining the upper surface and a second portion with a material different from the resist defining the rest of the upper surface on a table in the immersion lithographic apparatus, confining liquid on a region of an upper surface of the table and/or the upper surface of the test substrate by operating the fluid handing structure using the associated working parameters, moving the table such that the region moves from the second portion to the first portion, and detecting change to and/or residue on the first portion as a result of liquid being left behind on the first portion during the moving.