Best, Netherlands

Wouterus Jozephus Johannes Van Sluisveld


Average Co-Inventor Count = 10.0

ph-index = 1


Company Filing History:


Years Active: 2021

where 'Filed Patents' based on already Granted Patents

1 patent (USPTO):

Title: Wouterus Jozephus Johannes Van Sluisveld: Pioneering Innovations in Lithography

Introduction

Wouterus Jozephus Johannes Van Sluisveld, a distinguished inventor hailing from Best, NL, has carved a remarkable legacy in the realm of innovation with his unwavering commitment to pushing the boundaries of technology. His pioneering work has significantly influenced society and advanced the field of lithography.

Latest Patents

With a profound understanding of fluid handling structures in immersion lithographic apparatus, Van Sluisveld has successfully patented a groundbreaking method for testing working parameters and detecting loss of immersion liquid. This patent, which marks a turning point in lithographic technology, showcases his ingenuity and creativity in solving complex challenges.

Career Highlights

Throughout his illustrious career at ASML Netherlands B.V., Van Sluisveld has been instrumental in driving innovation and developing cutting-edge solutions for the semiconductor industry. His expertise and innovative thinking have led to the creation of revolutionary technologies that have redefined the standards of precision and efficiency in lithography.

Collaborations

Van Sluisveld's collaborative spirit and dedication to teamwork have been exemplified through partnerships with esteemed colleagues such as Giovanni Luca Gattobigio and Nirupam Banerjee. Together, they have worked tirelessly to bring forth inventive solutions and shape the future of lithographic processes.

Conclusion

In conclusion, Wouterus Jozephus Johannes Van Sluisveld stands as a beacon of innovation, whose contributions have left an indelible mark on the world of technology. His inventive spirit, coupled with his technical acumen, continues to inspire future generations of inventors and engineers to push the boundaries of what is possible in the ever-evolving landscape of lithography.

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