The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 20, 2026
Filed:
Mar. 10, 2022
Asml Netherlands B.v., Veldhoven, NL;
Cornelius Maria Rops, Waalre, NL;
Giovanni Luca Gattobigio, Eindhoven, NL;
Erik Henricus Egidius Catharina Eummelen, Veldhoven, NL;
Dennis Van Den Berg, Eindhoven, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A fluid handling system for a lithographic apparatus, the fluid handling system configured to confine immersion liquid to a liquid confinement space between a part of a projection system and a surface of a substrate in the lithographic apparatus wherein a radiation beam projected from the projection system can irradiate the surface of the substrate by passing through the immersion liquid, the fluid handling system including: a liquid extraction member, having an inlet side and an outlet side, that is arranged to extract the immersion liquid from the liquid confinement space by a fluid flow from the inlet side to the outlet side; and a further liquid supply to the outlet side of the liquid extraction member arranged so that the outlet side receives liquid from a different source than the liquid confinement space.