Eindhoven, Netherlands

Dennis Van Den Berg

USPTO Granted Patents = 2 

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2022-2025

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2 patents (USPTO):Explore Patents

Title: The Innovation Journey of Dennis Van Den Berg

Introduction:

Dennis Van Den Berg, a renowned inventor based in Eindhoven, NL, has made significant contributions to the field of lithography with his inventive solutions. With a patent on a substrate holder for use in a lithographic apparatus, Dennis Van Den Berg continues to push the boundaries of innovation in the industry.

Latest Patents:

Dennis Van Den Berg holds a crucial patent for a substrate holder designed for lithographic apparatus. This innovative holder features a main body, a series of support elements, and a seal unit. The unique design ensures the efficient loading and unloading of substrates, optimizing the overall lithographic process.

Career Highlights:

Having worked with leading companies like ASML Netherlands B.V. and ASML Holding N.V., Dennis Van Den Berg has honed his expertise in lithography and precision engineering. His dedication to innovation has led to the development of cutting-edge solutions that elevate the performance of lithographic apparatus.

Collaborations:

Throughout his career, Dennis Van Den Berg has collaborated with talented individuals in the industry, including Thomas Poiesz and Coen Hubertus Matheus Baltis. These collaborations have fueled creativity and facilitated the exchange of ideas, resulting in groundbreaking inventions and advancements in lithography technology.

Conclusion:

Dennis Van Den Berg's inventive spirit and commitment to excellence have cemented his position as a visionary in the field of lithography. His contributions to the development of substrate holders and other innovative solutions continue to drive progress and inspire future generations of inventors.

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