The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 20, 2022
Filed:
Nov. 22, 2018
Asml Netherlands B.v., Veldhoven, NL;
Asml Holding N.v., Veldhoven, NL;
Thomas Poiesz, Veldhoven, NL;
Coen Hubertus Matheus Baltis, Eindhoven, NL;
Abraham Alexander Soethoudt, Eindhoven, NL;
Mehmet Ali Akbas, Cheshire, CT (US);
Dennis Van Den Berg, Eindhoven, NL;
Wouter Vanesch, Lummen, BE;
Marcel Maria Cornelius Franciscus Teunissen, Grathem, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
ASML HOLDING N.V., Veldhoven, NL;
Abstract
A substrate holder, for a lithographic apparatus, having a main body, a plurality of support elements to support a substrate and a seal unit. The seal unit may include a first seal positioned outward of and surrounding the plurality of support elements. A position of a substrate contact region of an upper surface of the first seal may be arranged at a distance from the plurality of support elements sufficient enough such that during the loading/unloading of the substrate, a force applied to the first seal by the substrate is greater than a force applied to the plurality of support elements by the substrate. A profile of the contact region, in a cross section through the seal, may have a shape which is configured such that during the loading/unloading of the substrate, the substrate contacts the seal via at least two different points of the profile.