Asml Netherlands B.v.

Giovanni Luca Gattobigio

Theodorus Wilhelmus Polet

Erik Henricus Egidius Catharina Eummelen

Cornelius Maria Rops

Han Henricus Aldegonda Lempens

Johannes Cornelis Paulus Melman

Miao Yu

Harold Sebastiaan Buddenberg

Gheorghe Tanasa

Jorge Alberto Vieyra Salas

Koen Cuypers

Ruud Olieslagers

Floor Lodewijk Keukens

Daan Daniel Johannes Antonius Van Sommeren

Patrick Johannes Wilhelmus Spruytenburg

Walter Theodorus Matheus Stals

Artunç Ulucan

Nicolaas Ten Kate

Rogier Hendrikus Magdalena Cortie

Ferdy Migchelbrink

Mark Johannes Hermanus Frencken

John Maria Bombeeck

Evert Van Vliet

Pepijn Van Den Eijnden

Marcel Maria Cornelius Franciscus Teunissen

Petrus Martinus Gerardus Johannes Arts

Frank Debougnoux

Jantien Laura Van Erve

Raphael Nico Johan Stegen

Ronald Van Der Ham

Yuri Johannes Gabriël Van De Vijver

David Bessems

Jimmy Matheus Wilhelmus Van De Winkel

Arnoldus Johannes Martinus Jozeph Ras

Günes Nakiboglu

Coen Hubertus Matheus Baltis

Christianus Wilhelmus Johannes Berendsen

Aleksandar Nikolov Zdravkov

Jeroen Arnoldus Leonardus Johannes Raaymakers

Victor Manuel Blanco Carballo

Ronald Frank Kox

Frederik Antonius Van Der Zanden

Marijn Wouters

Wilhelmus Antonius Wernaart

Seerwan Saeed

Josephus Peter Van Lieshout

Laurentius Johannes Adrianus Van Bokhoven

Gerben Pieterse

Johan Franciscus Maria Beckers

Marcus Johannes Van Der Zanden

Nirupam Banerjee

Rik Vangheluwe

Maarten Holtrust

Pieter Jeroen Johan Emanuel Hoefnagels

Wouterus Jozephus Johannes Van Sluisveld

Johannes Cornelius Paulus Melman

Maarten Marinus Van Oene

Mike Paulus Johannes Van Gils

Disclosed herein is a fluid handling system for a lithographic apparatus, wherein the fluid handling system is configured to confine immersion liquid to a liquid confinement space between a part of a projection system and a surface of a substrate in the lithographic apparatus whereby a radiation beam projected from the projection system can irradiate the surface of the substrate by passing through the immersion liquid, the fluid handling system comprising: a damper arranged between a first extraction member and a second extraction member both configured to extract fluid; wherein the damper is configured to support a meniscus of the immersion liquid between a surface of the damper and the surface of the substrate.

Fluid handling system, method and lithographic apparatus

An immersion lithography apparatus controller configured to control a positioner to move a support table to follow an exposure route and to control a liquid confinement structure, the controller configured to: predict whether liquid will be lost from an immersion space during at least one motion of the route in which an edge of the object passes under an edge of the immersion space, and if liquid loss from the immersion space is predicted, modify the fluid flow such that a first fluid flow rate into or out of an opening at a leading edge of the liquid confinement structure is different to a second fluid flow rate into or out of an opening at a trailing edge of the liquid confinement structure during the motion of predicted liquid loss or a motion of the route subsequent to the motion of predicted liquid loss.

Lithography apparatus and a method of manufacturing a device

A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.

Fluid handling structure for lithographic apparatus

A fluid handling structure configured to confine immersion fluid to a region of a lithographic apparatus, the fluid handling structure comprising an aperture formed therein for the passage therethrough of a radiation beam through the immersion fluid, the aperture defining an immersion space to be filled with the immersion fluid, and an inner part and an outer part; wherein the inner part and the outer part are arranged so as to form therebetween a variable space and a connecting space that connects the variable space to the immersion space, wherein the outer part is movable relative to the inner part in a first plane so as to change in shape the variable space but not the connecting space, and wherein the fluid handling structure is configured to contain the immersion fluid in the variable space.

Fluid handling structure, a lithographic apparatus, a method of using a fluid handling structure and a method of using a lithographic apparatus

Lithography apparatus and device manufacturing method

A process tool for processing production substrates, the process tool including: a movable stage configured to perform long-stroke movements in an X-Y plane; an imaging device mounted to a fixed part of the tool and having an optical axis substantially parallel to the X-Y plane; and a mirror mounted on the movable stage and oriented at a predetermined angle of inclination to the X-Y plane so that by moving the movable stage to a predetermined position a part of a component to be inspected can be imaged by the imaging device.

Process tool and an inspection method

An immersion lithographic apparatus having a fluid handling structure, the fluid handling structure configured to confine immersion fluid to a region and including: a meniscus controlling feature having an extractor exit on a surface of the fluid handling structure; and a gas knife system outwards of the extractor exit and including passages each having an exit, the passages having a plurality of first passages having a plurality of corresponding first exits on the surface, and a plurality of second passages having a plurality of corresponding second exits outwards of the first exits on the surface, wherein the surface faces and is substantially parallel to a top surface of a substrate during exposure, and the first exits and the second exits are arranged at a greater distance from the substrate than the extractor exit.

Fluid handling structure and lithographic apparatus

A device manufacturing method using a lithographic apparatus having a localized immersion system for confining an immersion liquid to a space between a projection system and a substrate to be exposed by the projection system, the method including: predicting a set of first locations on the substrate having a risk of residual liquid from the immersion system when exposed using an initial route for a substrate to expose a plurality of fields thereon; determining a set of modifications to the initial route to reduce the risk of residual loss; test exposing at least one test substrate using the initial route; obtaining a set of second locations of defects in the exposed test substrate; selecting a subset of the set of modifications by comparing the first locations and the second locations; and exposing a plurality of production substrates using the initial route modified by the selected subset of modifications.

Device manufacturing method and computer program

A fluid handling structure configured to confine immersion fluid to a region of a lithographic apparatus, the fluid handling structure having an aperture formed therein for the passage therethrough of a radiation beam through the immersion fluid, the aperture defining an immersion space to be filled with the immersion fluid, and having an inner part and an outer part, wherein the inner part and the outer part are arranged so as to form therebetween a variable space and a connecting space that connects the variable space to the immersion space, wherein the outer part is movable relative to the inner part in a first plane so as to change in shape the variable space but not the connecting space, and wherein the fluid handling structure is configured to contain the immersion fluid in the variable space.

Fluid handling structure, lithographic apparatus, and method of using a fluid handling structure

A method of performance testing working parameters of a fluid handing structure in an immersion lithographic apparatus, the method including: placing a test substrate having an upper surface with a first portion with a resist defining the upper surface and a second portion with a material different from the resist defining the rest of the upper surface on a table in the immersion lithographic apparatus, confining liquid on a region of an upper surface of the table and/or the upper surface of the test substrate by operating the fluid handing structure using the associated working parameters, moving the table such that the region moves from the second portion to the first portion, and detecting change to and/or residue on the first portion as a result of liquid being left behind on the first portion during the moving.

Method of performance testing working parameters of a fluid handling structure and a method of detecting loss of immersion liquid from a fluid handing structure in an immersion lithographic apparatus

A cleaning device for an apparatus for processing production substrates, the cleaning device including: a body having dimensions similar to the production substrates so that the cleaning device is compatible with the apparatus, the body having a first major surface and a second major surface facing in the opposite direction to the first major surface; a chamber within the body configured to accommodate contaminants; an inlet from the first major surface to the chamber and configured to allow contaminants to be drawn into the chamber by a flow of fluid; and an outlet from the chamber to the second major surface, the cleaning device being configured to allow the fluid to exit the chamber but to prevent a contaminant leaving the chamber.

Cleaning device and method of cleaning

Growing community of inventors

Eindhoven, Netherlands

Giovanni Luca Gattobigio