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Veldhoven, Netherlands

Jozef Maria Finders

This inventor holds 50 USPTO granted patents and 6 published patent applications and 1 EPO patent, primarily in Lithography Technology. Top assignees: Asml Netherlands B.v., Carl Zeiss Smt Gmbh, Carl-Zeiss-Smt Ag. Active years: 2004-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jozef Maria Finders. Retrieved from https://idiyas.com/inventor/jozef-maria-finders

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 50 

% Patents Active = 54.0

 

Average Co-Inventor Count = 2.1

ph-index = 7

Forward Citations = 219(Granted Patents)

Forward Citations (Not Self Cited) = 200(Dec 10, 2025)


Company Filing History:

goldMedal50 out of 5,075 
 
Asml Netherlands B.v.
 patents
silverMedal2 out of 1,479 
 
Carl Zeiss Smt Gmbh
 patents
bronzeMedal2 out of 461 
 
Carl-Zeiss-Smt Ag
 patents
4. 1 out of 630 
 
Asml Holding N.v.
 patents
where one patent can have more than one assignee

Years Active: 2004-2025

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Areas of Expertise:
Lithographic Apparatus
Patterning Device
Self-Assembling Polymers
Epitaxy Templates
Mask Patterns
Dose Sensitivity
Exposure Methods
Device Manufacturing
Illumination Profile
Optical Proximity Effects
Patterning Optimization
Substrate Processing
50 patents (USPTO):Explore Patents
1. 12197120 - Patterning device and method of use thereof (2025-01-14),
2. 10775705 - Patterning stack optimization (2020-09-15),
3. 10732498 - Patterning device (2020-08-04),
4. 10551736 - Methods for providing lithography features on a substrate by self-assembly of block copolymers (2020-02-04),
5. 10401723 - Patterning device (2019-09-03),
6. 10331042 - Method for a lithographic apparatus (2019-06-25),
7. 10240250 - Method to provide a patterned orientation template for a self-assemblable polymer (2019-03-26),
8. 9811002 - Determination and application of non-monotonic dose sensitivity (2017-11-07),
9. 9535341 - Method for a lithographic apparatus (2017-01-03),
10. 9513553 - Methods of providing patterned epitaxy templates for self-assemblable block copolymers for use in device lithography (2016-12-06),
11. 9513109 - Lithographic mask, lithographic apparatus and method (2016-12-06),
12. 9285685 - Lithographic apparatus and device manufacturing method (2016-03-15),
13. 9229336 - Lithographic apparatus and methods for determining an improved configuration of a lithographic apparatus (2016-01-05),
14. 9229324 - Methods of providing patterned templates for self-assemblable block copolymers for use in device lithography (2016-01-05),
15. 9170502 - Method of optimizing a lithographic process, device manufacturing method, lithographic apparatus, computer program product and simulation apparatus (2015-10-27),

Sure, I can help you with that! Here is the article about inventor Jozef Maria Finders:

Title: Unveiling the Innovation Journey of Jozef Maria Finders

Introduction:

Jozef Maria Finders, a prolific inventor based in Veldhoven, NL, has made significant contributions to the field of patterning technology with a remarkable portfolio of 49 patents. His dedication to pushing the boundaries of innovation is evident in his latest patents, which focus on optimizing patterning stacks for enhanced performance.

Latest Patents:

Finders' recent patents showcase his expertise in patterning stack optimization and the development of advanced patterning devices. One of his inventions involves a novel method for tuning a patterning stack to achieve superior pattern transfer on substrates, utilizing cutting-edge computer systems to enhance efficiency and accuracy. Another patent introduces a groundbreaking patterning device featuring a reflective marker with specialized reflective and absorbing regions, designed to manipulate radiation for precise patterning applications.

Career Highlights:

Having worked with renowned companies such as ASML Netherlands B.V. and Carl Zeiss SMT AG, Jozef Maria Finders has honed his skills and expertise in the complex realm of semiconductor technology. His innovative mindset and technical prowess have played a crucial role in driving advancements in the semiconductor industry, particularly in the development of state-of-the-art patterning solutions.

Collaborations:

Throughout his career, Jozef Maria Finders has collaborated with esteemed professionals in the field, including Laurentius Cornelius De Winter and Johannes Jacobus Matheus Baselmans. These collaborations have enriched his work, fostering a dynamic environment for idea exchange and innovation within the semiconductor sector.

Conclusion:

In conclusion, Jozef Maria Finders emerges as a trailblazer in the realm of semiconductor technology, with a remarkable track record of pioneering inventions and patents. His relentless pursuit of innovation, coupled with his collaborative spirit, continues to shape the landscape of patterning technology, paving the way for future advancements in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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