The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 15, 2016
Filed:
Apr. 24, 2014
Asml Netherlands B.v., Veldhoven, NL;
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Bob Streefkerk, Tilburg, NL;
Johannes Jacobus Matheus Baselmans, Oirschot, NL;
Adrianus Franciscus Petrus Engelen, Waalre, NL;
Jozef Maria Finders, Veldhoven, NL;
Paul Gräupner, Aalen, DE;
Johannes Catharinus Hubertus Mulkens, Waalre, NL;
Jan Bernard Plechelmus Van Schoot, Eindhoven, NL;
ASML NETHERLANDS B.V., Vledhoven, NL;
CARL ZEISS SMT GmbH, Oberkochen, DE;
Abstract
In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile