The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 04, 2020
Filed:
Jul. 26, 2013
Asml Netherlands B.v., Veldhoven, NL;
Jozef Maria Finders, Veldhoven, NL;
Tamara Druzhinina, Eindhoven, NL;
Emiel Peeters, Eindhoven, NL;
Sander Frederik Wuister, Eindhoven, NL;
Christianus Martinus Van Heesch, Eindhoven, NL;
Eddy Cornelis Antonius Van Der Heijden, Netersel, NL;
Henri Marie Joseph Boots, Best, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method of designing an epitaxy template to direct self-assembly of a block copolymer on a substrate into an ordered target pattern involves providing a primary epitaxy template design and then varying the design to optimize a pattern fidelity statistic, such as placement error, relative to the target pattern by modelling predicted self-assembled block copolymer patterns and optimizing pattern placement as a function of a varied design parameter. In addition to varying a design parameter to optimize the pattern fidelity statistic, a random error in the template design is included prior to modelling predicted patterns in order to compensate for expected template inaccuracy in practice. The inclusion of a realistic random error in the template design, in addition to systematic variation of a design parameter, may improve the template design optimization to render the result less sensitive to error which may be inevitable in practice.