The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 27, 2018
Filed:
Mar. 04, 2014
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
James Norman Wiley, Menlo Park, NL;
Juan Diego Arias Espinoza, Eindhoven, NL;
Derk Servatius Gertruda Brouns, Herentals, BE;
Laurentius Cornelius De Winter, Vessem, NL;
Florian Didier Albin Dhalluin, Eindhoven, NL;
Pedro Julian Rizo Diago, Veldhoven, NL;
Luigi Scaccabarozzi, Valkenswaard, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/54 (2006.01); G03F 1/64 (2012.01); G03F 1/62 (2012.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 1/64 (2013.01); G03F 1/62 (2013.01); G03F 7/70908 (2013.01); G03F 7/70983 (2013.01);
Abstract
The present invention is concerned with an apparatus for shielding a reticle for EUV lithography. The apparatus comprises a pellicle, and at least one actuator in communication with the pellicle, the actuator being configured to induce, in use, movement of the pellicle with respect to a reticle.