Luigi Scaccabarozzi

USPTO Granted Patents = 12 (Patent Applications = 9)

EPO Patents = 2 (Patent Applications = 2)

Average Co-Inventor Count = 4.7

ph-index = 3

Forward Citations = 31(Granted Patents)

Company Filing History:

12 out of 4,883

Asml Netherlands B.v.

where one patent can have more than one assignee

Years Active: 2013-2020

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12 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 10698312 - Membranes for use within a lithographic apparatus and a lithographic apparatus comprising such a membrane (2020-06-30),

2. 10678140 - Suppression filter, radiation collector and radiation source for a lithographic apparatus; method of determining a separation distance between at least two reflective surface levels of a suppression filter (2020-06-09),

3. 10228615 - Membranes for use within a lithographic apparatus and a lithographic apparatus comprising such a membrane (2019-03-12),

4. 10139725 - Lithographic apparatus (2018-11-27),

5. 9606445 - Lithographic apparatus and method of manufacturing a device (2017-03-28),

6. 9563137 - Lithographic apparatus and device manufacturing method (2017-02-07),

7. 9488922 - Methods and apparatus for inspection of articles, EUV lithography reticles, lithography apparatus and method of manufacturing devices (2016-11-08),

8. 9298110 - Radiation source apparatus, lithographic apparatus, method of generating and delivering radiation and method for manufacturing a device (2016-03-29),

9. 9122178 - Object inspection systems and methods (2015-09-01),

10. 8830455 - Inspection method and apparatus (2014-09-09),

11. 8477285 - Particle cleaning of optical elements for microlithography (2013-07-02),

12. 8405825 - Method of detecting a particle and a lithographic apparatus (2013-03-26),

Title: Luigi Scaccabarozzi: Pioneering Innovations in Lithography

Introduction:

Luigi Scaccabarozzi, a visionary inventor based in Valkenswaard, Netherlands, has made significant contributions to the world of technology and innovation. With 12 patents to his name, Luigi is known for his groundbreaking work in the field of lithography.

Latest Patents:

Among his latest patents include "Membranes for use within a lithographic apparatus" which are transmissive to EUV radiation and can be utilized as pellicles or spectral filters in lithographic systems. These membranes feature innovative high doped regions and low doping regions to enhance performance. Additionally, Luigi's patent on a "Suppression filter, radiation collector and radiation source for a lithographic apparatus" demonstrates his expertise in developing advanced solutions for preventing specular reflection in lithography.

Career Highlights:

Luigi Scaccabarozzi has worked with renowned companies such as ASML Netherlands B.V. and Carl Zeiss SMT GmbH, where he honed his skills and expertise in lithographic technologies. His hands-on experience in developing cutting-edge solutions for lithographic equipment has set him apart as a leader in the industry.

Collaborations:

Throughout his career, Luigi has collaborated with esteemed professionals in the field, including Vadim Yevgenyevich Banine and Florian Didier Albin Dhalluin. These collaborations have led to the development of innovative technologies and solutions that have pushed the boundaries of what is achievable in lithography.

Conclusion:

In conclusion, Luigi Scaccabarozzi stands as a beacon of creativity and ingenuity in the world of inventions. His pioneering work continues to inspire future generations of inventors to push the limits of what is possible in the realm of technology and innovation. With his relentless dedication to innovation, Luigi is shaping the future of lithography and leaving a lasting impact on the industry.

This text is generated by artificial intelligence and may not be accurate.