The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 09, 2020

Filed:

Aug. 02, 2016
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Vadim Yevgenyevich Banine, Deurne, NL;

Han-Kwang Nienhuys, Utrecht, NL;

Luigi Scaccabarozzi, Valkenswaard, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); H05G 2/00 (2006.01); G02B 5/18 (2006.01); G02B 27/42 (2006.01); G02B 5/20 (2006.01); G02B 5/28 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70191 (2013.01); G02B 5/1861 (2013.01); G02B 5/208 (2013.01); G02B 5/281 (2013.01); G02B 27/4244 (2013.01); G02B 27/4277 (2013.01); G03F 7/70033 (2013.01); G03F 7/70158 (2013.01); G03F 7/70175 (2013.01); G03F 7/70575 (2013.01); H05G 2/008 (2013.01);
Abstract

Disclosed is a suppression filter having a profile defining at least two reflective surface levels, each reflected surface level being separated by a separation distance. The separation distance is such that the reflective suppression filter is operable to substantially prevent specular reflection of radiation at a first wavelength and at a second wavelength incident on said reflective suppression filter. Also disclosed is a radiation collector, radiation source and lithographic apparatus comprising such a suppression filter, and to a method of determining a separation distance between at least two reflective surface levels of a suppression filter.


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