The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 12, 2019
Filed:
Jul. 02, 2015
Asml Netherlands B.v., Veldhoven, NL;
Andrey Alexandrovich Nikipelov, Eindhoven, NL;
Vadim Yevgenyevich Banine, Deurne, NL;
Jozef Petrus Henricus Benschop, Veldhoven, NL;
Arjen Boogaard, Nijmegen, NL;
Florian Didier Albin Dhalluin, Eindhoven, NL;
Alexey Sergeevich Kuznetsov, Zaltbommel, NL;
Mária Péter, Eindhoven, NL;
Luigi Scaccabarozzi, Valkenswaard, NL;
Willem Joan Van Der Zande, Bussum, NL;
Pieter-Jan Van Zwol, Eindhoven, NL;
Andrei Mikhailovich Yakunin, Mierlo, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A membrane transmissive to EUV radiation, which may be used as a pellicle or spectral filter in a lithographic apparatus. The membrane includes one or more high doped regions wherein the membrane is doped with a dopant concentration greater than 10cm, and one or more regions with low (or no) doping. The membrane may have a main substrate having low doping and one or more additional layers, wherein the high doped regions are comprised within some or all of the additional layers.