The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 28, 2017
Filed:
Jul. 30, 2013
Asml Netherlands B.v., Veldhoven, NL;
Vadim Yevgenyevich Banine, Deurne, NL;
Arthur Winfried Eduardus Minnaert, Veldhoven, NL;
Marcel Johannus Elisabeth Hubertus Muitjens, Nuth, NL;
Andrei Mikhailovich Yakunin, Mierlo, NL;
Luigi Scaccabarozzi, Valkenswaard, NL;
Hans Joerg Mallmann, Zornheim, DE;
Kurstat Bal, Arnhem, NL;
Carlo Cornelis Maria Luijten, Duizel, NL;
Han-Kwang Nienhuys, Utrecht, NL;
Alexander Marinus Arnoldus Huijberts, Veghel, NL;
Paulus Albertus Maria Gasseling, Steensel, NL;
Pedro Julian Rizo Diago, Veldhoven, NL;
Maarten Van Kampen, Eindhoven, NL;
Nicolaas Aldegonda Jan Maria Van Aerle, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
There is disclosed a lithographic apparatus provided with a spectral purity filter which may be provided in one or more of the following locations: (a) in the illumination system, (b) adjacent the patterning device, either a static location in the radiation beam or fixed for movement with the patterning device, (c) in the projection system, and (d) adjacent the substrate table. The spectral purity filter is preferably a membrane formed of polysilicon, a multilayer material, a carbon nanotube material or graphene. The membrane may be provided with a protective capping layer, and/or a thin metal transparent layer.