Waalre, Netherlands

Eelco Van Setten


Average Co-Inventor Count = 3.8

ph-index = 1


Location History:

  • Eindhoven, NL (2017)
  • Waalre, NL (2021 - 2023)

Company Filing History:


Years Active: 2017-2023

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4 patents (USPTO):Explore Patents

Title: Eelco Van Setten: Pioneer in Innovations

Introduction:

Eelco Van Setten, a visionary inventor hailing from Waalre, NL, has carved a remarkable path in the world of inventions with his relentless drive for innovation.

Latest Patents:

Van Setten's latest patents include a groundbreaking "Method for high numerical aperture thru-slit source mask optimization" and "Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method." These patents exemplify his expertise in pushing the boundaries of lithographic projection technology.

Career Highlights:

With a total of 4 patents to his name, Van Setten has made significant contributions to the field of lithography. His method for source mask optimization showcases his ability to optimize illumination systems and projection optics for enhanced imaging performance.

Collaborations:

Van Setten collaborates closely with esteemed colleagues such as Laurentius Cornelius De Winter and Anton Bernhard Van Oosten at ASML Netherlands B.V. Their combined efforts have led to the development of cutting-edge technologies in the semiconductor industry.

Conclusion:

Eelco Van Setten's passion for innovation, coupled with his groundbreaking patents and collaborative spirit, cements his position as a true pioneer in the world of inventions. His contributions continue to shape the future of lithography and inspire the next generation of inventors.

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