The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 25, 2023
Filed:
Oct. 16, 2020
Asml Netherlands B.v., Veldhoven, NL;
Adriaan Johan Van Leest, Eindhoven, NL;
Anagnostis Tsiatmas, Eindhoven, NL;
Paul Christiaan Hinnen, Veldhoven, NL;
Elliott Gerard McNamara, Eindhoven, NL;
Alok Verma, Eindhoven, NL;
Thomas Theeuwes, Veldhoven, NL;
Hugo Augustinus Joseph Cramer, Eindhoven, NL;
Maria Isabel De La Fuente Valentin, Eindhoven, NL;
Koen Van Witteveen, Rotterdam, NL;
Martijn Maria Zaal, Veldhoven, NL;
Shu-jin Wang, Veldhoven, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A metrology target includes: a first structure arranged to be created by a first patterning process; and a second structure arranged to be created by a second patterning process, wherein the first structure and/or second structure is not used to create a functional aspect of a device pattern, and wherein the first and second structures together form one or more instances of a unit cell, the unit cell having geometric symmetry at a nominal physical configuration and wherein the unit cell has a feature that causes, at a different physical configuration than the nominal physical configuration due to a relative shift in pattern placement in the first patterning process, the second patterning process and/or another patterning process, an asymmetry in the unit cell.