The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 12, 2021
Filed:
Nov. 02, 2018
Asml Netherlands B.v., Veldhoven, NL;
Anagnostis Tsiatmas, Eindhoven, NL;
Paul Christiaan Hinnen, Veldhoven, NL;
Elliott Gerard McNamara, Eindhoven, NL;
Thomas Theeuwes, Veldhoven, NL;
Maria Isabel De La Fuente Valentin, Eindhoven, NL;
Mir Homayoun Shahrjerdy, Eindhoven, NL;
Arie Jeffrey Den Boef, Waalre, NL;
Shu-jin Wang, Veldhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method including: obtaining a detected representation of radiation redirected by each of a plurality of structures from a substrate additionally having a device pattern thereon, wherein each structure has an intentional different physical configuration of the respective structure than the respective nominal physical configuration of the respective structure, wherein each structure has geometric symmetry at the respective nominal physical configuration, wherein the intentional different physical configuration of the structure causes an asymmetric optical characteristic distribution and wherein a patterning process parameter measures change in the physical configuration; and determining a value, based on the detected representations and based on the intentional different physical configurations, to setup, monitor or correct a measurement recipe for determining the patterning process parameter.