The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 26, 2021
Filed:
Mar. 04, 2020
Asml Netherlands B.v., Veldhoven, NL;
Edo Maria Hulsebos, Waalre, NL;
Patricius Aloysius Jacobus Tinnemans, Hapert, NL;
Ralph Brinkhof, Vught, NL;
Pieter Jacob Heres, Veldhoven, NL;
Jorn Kjeld Lucas, Eindhoven, NL;
Loek Johannes Petrus Verhees, Reusel, NL;
Ingrid Margaretha Ardina Van Donkelaar, Eindhoven, NL;
Franciscus Godefridus Casper Bijnen, Valkenswaard, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
In a method of controlling a lithographic apparatus, historical performance measurements are used to calculate a process model relating to a lithographic process. Current positions of a plurality of alignment marks provided on a current substrate are measured and used to calculate a substrate model relating to a current substrate. Additionally, historical position measurements obtained at the time of processing the prior substrates are used with the historical performance measurements to calculate a model mapping. The model mapping is applied to modify the substrate model. The lithographic apparatus is controlled using the process model and the modified substrate model together. Overlay performance is improved by avoiding over- or under-correction of correlated components of the process model and the substrate model. The model mapping may be a subspace mapping, and dimensionality of the model mapping may be reduced, before it is used.