The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 23, 2014

Filed:

Mar. 12, 2010
Applicants:

Arie Jeffrey Den Boef, Waalre, NL;

Jozef Petrus Henricus Benschop, Veldhoven, NL;

Ralph Brinkhof, 's-Hertogenbosch, NL;

Lukasz Jerzy Macht, Eindhoven, NL;

Inventors:

Arie Jeffrey Den Boef, Waalre, NL;

Jozef Petrus Henricus Benschop, Veldhoven, NL;

Ralph Brinkhof, 's-Hertogenbosch, NL;

Lukasz Jerzy Macht, Eindhoven, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/14 (2006.01); G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
G03F 9/7034 (2013.01); G03F 9/7088 (2013.01);
Abstract

A level sensor arrangement is useable for measuring a height of a surface of a substrate in a lithographic apparatus. The level sensor arrangement is provided with a light source emitting detection radiation towards the substrate, and a detector unit for measuring radiation reflected from the substrate in operation. The light source is arranged to emit detection radiation in a wavelength range in which a resist to be used for processing the substrate in the lithographic apparatus is sensitive.


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