The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2020
Filed:
May. 10, 2019
Asml Netherlands B.v., Veldhoven, NL;
Edo Maria Hulsebos, Waalre, NL;
Patricius Aloysius Jacobus Tinnemans, Hapert, NL;
Ralph Brinkhof, Vught, NL;
Pieter Jacob Heres, Veldhoven, NL;
Jorn Kjeld Lucas, Eindhoven, NL;
Loek Johannes Petrus Verhees, Reusel, NL;
Ingrid Margaretha Ardina Van Donkelaar, Eindhoven, NL;
Franciscus Godefridus Casper Bijnen, Valkenswaard, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic technique that involves obtaining values of parameters of a substrate deformation model, wherein the values are based on positional data obtained from an alignment system for a lithographic apparatus; modifying the values using a mapping operation, wherein the mapping operation is based on a correlation found between the parameters and overlay data for a previous set of substrates; and generating, based on the modified values, electronic data adapted to configure the lithographic apparatus.