The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 26, 2012
Filed:
Feb. 06, 2009
David Warren Burry, Veldhoven, NL;
Ralph Brinkhof, 's-Hertogenbosch, NL;
Frank Staals, Eindhoven, NL;
Robert Franken, Deurne, NL;
Erik Johan Koop, Eindhoven, NL;
David Warren Burry, Veldhoven, NL;
Ralph Brinkhof, 's-Hertogenbosch, NL;
Frank Staals, Eindhoven, NL;
Robert Franken, Deurne, NL;
Erik Johan Koop, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
Embodiments of the invention relate to a method for determining exposure settings for a target field on a substrate in a lithographic exposure process, including providing calibration data by determining the position of a calibration field in a first direction at a plurality of calibration positions in a second and third direction relative to the position of the calibration field. The method also includes providing production data by establishing the position on the substrate of the target field in the second and third direction and by measuring the position of the exposure field in the first direction at least one measurement position relative to the position of the exposure field in the second and third direction.