David Warren Burry

Title: Innovator Spotlight - David Warren Burry

Introduction:

David Warren Burry, a prolific inventor based in Veldhoven, NL, has made significant contributions to the field of lithographic technology with his groundbreaking patent.

Latest Patents:

Burry's notable patent is the "Method for determining exposure settings, lithographic exposure apparatus, computer program and data carrier." This innovative method involves calibrating data and establishing production data for precise lithographic exposure processes, ensuring optimal exposure settings for target fields on substrates.

Career Highlights:

Working at ASML Netherlands B.V., a leading company in the semiconductor industry, Burry has demonstrated his expertise in lithographic technology. His commitment to innovation and problem-solving has resulted in the development of cutting-edge solutions for the industry.

Collaborations:

Throughout his career, Burry has collaborated with esteemed colleagues such as Ralph Brinkhof and Frank Staals. Together, they have worked on projects that have pushed the boundaries of lithographic technology and paved the way for new advancements in the field.

Conclusion:

David Warren Burry's remarkable contributions to the field of lithographic technology underscore his passion for innovation and his dedication to advancing the industry. His patent stands as a testament to his ingenuity and expertise, solidifying his reputation as a respected inventor in the semiconductor community.