Company Filing History:
Years Active: 2011-2012
Title: Innovator Spotlight: Robert Franken, Revolutionizing Lithographic Technology
Introduction: Robert Franken, a renowned inventor based in Deurne, Netherlands, is making significant strides in the field of lithographic technology with his groundbreaking patents.
Latest Patents:
1. Method for determining exposure settings, lithographic exposure apparatus, computer program, and data carrier: This patent introduces a method for accurately determining exposure settings for a target field on a substrate during the lithographic process. By providing calibration data and production data, this innovation enhances precision and efficiency in lithographic exposure.
2. Inspection method and apparatus lithographic apparatus, lithographic processing cell, device manufacturing method, and distance measuring system: Another pioneering patent by Robert Franken involves a scatterometer with a focus sensor that ensures precise measurements by detecting the correct focal plane. This invention revolutionizes distance measuring systems in lithographic processes.
Career Highlights: Robert Franken is a key figure at ASML Netherlands B.V., a leading technology company driving innovations in lithography. With his expertise, he has contributed significantly to the development of cutting-edge solutions that are shaping the future of semiconductor manufacturing.
Collaborations: Collaborating closely with his coworkers Johan Maria Van Boxmeer and Henricus Petrus Maria Pellemans, Robert Franken has synergized efforts to explore new frontiers in lithographic technology. Their teamwork and shared vision have led to remarkable advancements in the field.
Conclusion: Robert Franken's invaluable contributions to lithographic technology through his patents reflect his dedication to innovation and excellence. His collaborative spirit and inventive mindset continue to inspire breakthroughs in the industry, positioning him as a visionary inventor reshaping the landscape of lithography.