Asml Netherlands B.v.

Robert Franken

Frank Staals

Henricus Petrus Maria Pellemans

Ralph Brinkhof

Erik Johan Koop

Johan Maria Van Boxmeer

David Warren Burry

Embodiments of the invention relate to a method for determining exposure settings for a target field on a substrate in a lithographic exposure process, including providing calibration data by determining the position of a calibration field in a first direction at a plurality of calibration positions in a second and third direction relative to the position of the calibration field. The method also includes providing production data by establishing the position on the substrate of the target field in the second and third direction and by measuring the position of the exposure field in the first direction at least one measurement position relative to the position of the exposure field in the second and third direction.

Method for determining exposure settings, lithographic exposure apparatus, computer program and data carrier

A scatterometer has a focus sensor arranged to detect whether the target being measured is in a correct focal plane. A modulation is applied to a component of the focus sensor or the scatterometer such that a defocus as measured by the focus sensor varies according to a certain function. From knowledge of the modulation, the gain of the sensor can be calibrated.

Inspection method and apparatus lithographic apparatus, lithographic processing cell, device manufacturing method and distance measuring system

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Deurne, Netherlands

Robert Franken