The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 25, 2022
Filed:
Jul. 23, 2020
Asml Netherlands B.v., Veldhoven, NL;
Everhardus Cornelis Mos, Best, NL;
Jochem Sebastiaan Wildenberg, Aarle-Rixtel, NL;
Erik Johannes Maria Wallerbos, Helmond, NL;
Maurits Van Der Schaar, Eindhoven, NL;
Frank Staals, Eindhoven, NL;
Franciscus Hendricus Arnoldus Elich, Valkenswaard, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method for improving the yield of a lithographic process, the method including: determining a parameter fingerprint of a performance parameter across a substrate, the parameter fingerprint including information relating to uncertainty in the performance parameter; determining a process window fingerprint of the performance parameter across the substrate, the process window being associated with an allowable range of the performance parameter; and determining a probability metric associated with the probability of the performance parameter being outside an allowable range. Optionally a correction to the lithographic process is determined based on the probability metric.