The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 23, 2024
Filed:
Jul. 21, 2021
Asml Netherlands B.v., Veldhoven, NL;
Marc Hauptmann, Turnhout, BE;
Everhardus Cornelis Mos, Best, NL;
Weitian Kou, Eindhoven, NL;
Alexander Ypma, Veldhoven, NL;
Michiel Kupers, Veldhoven, NL;
Hyunwoo Yu, Hwaseong-si, KR;
Min-Sub Han, Yongin-Si, KR;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A lithographic process is performed on a set of semiconductor substrates consisting of a plurality of substrates. As part of the process, the set of substrates is partitioned into a number of subsets. The partitioning may be based on a set of characteristics associated with a first layer on the substrates. A fingerprint of a performance parameter is then determined for at least one substrate of the set of substrates. Under some circumstances, the fingerprint is determined for one substrate of each subset of substrates. The fingerprint is associated with at least the first layer. A correction for the performance parameter associated with an application of a subsequent layer is then derived, the derivation being based on the determined fingerprint and the partitioning of the set of substrates.