The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 16, 2010
Filed:
May. 26, 2006
Jacobus Burghoorn, Haelen, NL;
Jan Hauschild, Eindhoven, NL;
Arie Jeffrey Den Boef, Waalre, NL;
Martinus Hendrikus Antonius Leenders, Rhoon, NL;
Uwe Mickan, Veldhoven, NL;
Roeland Nicolaas Maria Vanneer, Eindhoven, NL;
Jacobus Burghoorn, Haelen, NL;
Jan Hauschild, Eindhoven, NL;
Arie Jeffrey Den Boef, Waalre, NL;
Martinus Hendrikus Antonius Leenders, Rhoon, NL;
Uwe Mickan, Veldhoven, NL;
Roeland Nicolaas Maria Vanneer, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method for performing a tilted focus test includes the steps of providing a target object, providing a projection beam of radiation using a radiation source, providing a reflective device to introduce a projected projection beam of radiation onto the target portion, introducing a first projected projection beam of radiation onto the target object using the reflective device in a first orientation, using a tilting device for tilting the reflective device to a second orientation to provide a second projection beam with a tilt relative to said first projection beam, introducing a second projected projection beam of radiation onto the target object, and determining a lateral shift of the first and second projected projection beams on the target object and determining from said lateral shift a defocus of the target object with respect to the projected projection beam.