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For the Inventor, By the Inventor

Veldhoven, Netherlands

Uwe Mickan

This inventor holds 20 USPTO granted patents and 3 published patent applications and 4 EPO patents, primarily in Lithographic Technology. Top assignees: Asml Netherlands B.v., Carl-Zeiss-Smt Ag. Active years: 2005-2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Uwe Mickan. Retrieved from https://idiyas.com/inventor/uwe-mickan

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 20 

% Patents Active = 30.0

 

Average Co-Inventor Count = 3.2

ph-index = 4

Forward Citations = 45(Granted Patents)


Location History:

  • Veldhoven, DE (2008)
  • Veldhoven, NL (2005 - 2018)

Company Filing History:

goldMedal20 out of 5,080 
 
Asml Netherlands B.v.
 patents
silverMedal1 out of 461 
 
Carl-Zeiss-Smt Ag
 patents
where one patent can have more than one assignee

Years Active: 2005-2018

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Areas of Expertise:
Lithographic Apparatus
Device Manufacturing
Optical Apparatus
Exposure Apparatus
Tilted Focus
Patterning Device
Calibration Apparatus
Actuator System
Semiconductor Device
Electric Field
Transmission Characteristics
20 patents (USPTO):Explore Patents
1. 10146142 - Lithographic apparatus and device manufacturing method (2018-12-04),
2. 9606448 - Lithographic apparatus and device manufacturing method (2017-03-28),
3. 9442388 - Lithographic apparatus and device manufacturing method (2016-09-13),
4. 8634062 - Actuator system, lithographic apparatus, method of controlling the position of a component and device manufacturing method (2014-01-21),
5. 8208123 - Lithographic apparatus and device manufacturing method (2012-06-26),
6. 7960074 - Method of generating a photolithography patterning device, computer program, patterning device, method of determining the position of a target image on or proximate a substrate, measurement device, and lithographic apparatus (2011-06-14),
7. 7834975 - Method and exposure apparatus for performing a tilted focus and a device manufactured accordingly (2010-11-16),
8. 7817246 - Optical apparatus (2010-10-19),
9. 7713665 - Lithographic apparatus and patterning device (2010-05-11),
10. 7518706 - Exposure apparatus, a tilting device method for performing a tilted focus test, and a device manufactured accordingly (2009-04-14),
11. 7514186 - System for electrically connecting a mask to earth, a mask (2009-04-07),
12. 7463336 - Device manufacturing method and apparatus with applied electric field (2008-12-09),
13. 7369216 - Lithographic system, method for adapting transmission characteristics of an optical pathway within a lithographic system, semiconductor device, method of manufacturing a reflective element for use in a lithographic system, and reflective element manufactured thereby (2008-05-06),
14. 7177010 - Lithographic apparatus and device manufacturing method (2007-02-13),
15. 7145640 - Lithographic apparatus, device manufacturing method and variable attenuator (2006-12-05),

Title: The Innovative Journey of Uwe Mickan

Introduction: Uwe Mickan, a pioneering inventor hailing from Veldhoven, NL, has made significant contributions to the world of technology and innovation through his groundbreaking inventions.

Latest Patents: Uwe Mickan's latest patents showcase his expertise in the field of semiconductor technology, with a focus on advanced lithography processes and equipment.

Career Highlights: With a career spanning over two decades, Uwe Mickan has held key roles in leading tech companies, driving research and development efforts that have resulted in cutting-edge inventions and patents.

Collaborations: Throughout his career, Uwe Mickan has collaborated with top researchers, engineers, and scientists in the industry, fostering a culture of innovation and excellence in all his projects.

Conclusion: Uwe Mickan's relentless pursuit of innovation and his passion for pushing the boundaries of technology make him a true trailblazer in the world of inventions. His work continues to inspire future generations of inventors and innovators.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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