The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 26, 2012
Filed:
Aug. 27, 2004
Erik Roelof Loopstra, Heeze, NL;
Johannes Jacobus Matheus Baselmans, Oirschot, NL;
Marcel Mathijs Theodore Marie Dierichs, Venlo, NL;
Johannes Christiaan Maria Jasper, Veldhoven, NL;
Hendricus Johannes Maria Meijer, Veldhoven, NL;
Uwe Mickan, Veldhoven, NL;
Johannes Catharinus Hubertus Mulkens, Waalre, NL;
Matthew Lipson, Stamford, CT (US);
Tammo Utterdijk, De Bilt, NL;
Erik Roelof Loopstra, Heeze, NL;
Johannes Jacobus Matheus Baselmans, Oirschot, NL;
Marcel Mathijs Theodore Marie Dierichs, Venlo, NL;
Johannes Christiaan Maria Jasper, Veldhoven, NL;
Hendricus Johannes Maria Meijer, Veldhoven, NL;
Uwe Mickan, Veldhoven, NL;
Johannes Catharinus Hubertus Mulkens, Waalre, NL;
Matthew Lipson, Stamford, CT (US);
Tammo Utterdijk, De Bilt, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaFis also disclosed.