The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2009
Filed:
Dec. 27, 2004
Jan Hauschild, Eindhoven, NL;
Arie Jeffrey Den Boef, Waalre, NL;
Martinus Hendrikus Antonius Leenders, Rotterdam, NL;
Uwe Mickan, Veldhoven, NL;
Roeland Nicolaas Maria Vanneer, Eindhoven, NL;
Jacobus Burghoorn, Haelen, NL;
Jan Hauschild, Eindhoven, NL;
Arie Jeffrey Den Boef, Waalre, NL;
Martinus Hendrikus Antonius Leenders, Rotterdam, NL;
Uwe Mickan, Veldhoven, NL;
Roeland Nicolaas Maria Vanneer, Eindhoven, NL;
Jacobus Burghoorn, Haelen, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
The present invention relates to an exposure apparatus that includes an illumination system for providing a projection beam of radiation, a support structure for supporting a device provided with a pattern, the device serving to impart the projection beam with a pattern in its cross-section; a table for holding a target object, a projection system for projecting the patterned beam onto the target object and a tilting device for providing the projection beam with a tilt. The tilting device is provided substantially in a pupil plane of the projection system.