The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 11, 2010
Filed:
Mar. 29, 2006
Uwe Mickan, Veldhoven, NL;
Antonius Johannes Josephus Dijsseldonk, Hapert, NL;
Uwe Mickan, Veldhoven, NL;
Antonius Johannes Josephus Dijsseldonk, Hapert, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A mask for a lithographic apparatus is disclosed, the mask having a patterned region bearing a pattern to be transferred onto a substrate and a border surrounding the patterned region, wherein at least part of the border has a plurality of elements, the dimensions of the elements being such that, during use, they would not be resolved at the substrate. Also, a lithographic apparatus is disclosed, the apparatus having a projection system, a substrate table arranged to hold a substrate, and a patterning device having a patterned region which bears a pattern to be transferred using a radiation beam via the projection system onto the substrate, at least part of a border surrounding the patterned region comprising a plurality of elements arranged to direct radiation onto the substrate, the dimensions of the elements such that, during use, they are not resolved at the substrate.