The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 13, 2009
Filed:
Jun. 25, 2004
Method for producing a marker on a substrate, lithographic apparatus and device manufacturing method
Maurits Van Der Schaar, Veldhoven, NL;
Jacobus Burghoorn, Haelen, NL;
Richard Johannes Franciscus Van Haren, Waalre, NL;
Everhardus Cornelis Mos, Eindhoven, NL;
Rene Monshouwer, Leiden, NL;
Maurits Van Der Schaar, Veldhoven, NL;
Jacobus Burghoorn, Haelen, NL;
Richard Johannes Franciscus Van Haren, Waalre, NL;
Everhardus Cornelis Mos, Eindhoven, NL;
Rene Monshouwer, Leiden, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method of producing a marker on a substrate includes projecting a patterned beam on a layer of resist disposed on a substrate in a lithographic apparatus to create a latent marker; and locally heating the substrate at the marker location in the lithographic apparatus to transform the latent marker into a detectable marker.