The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 12, 2008
Filed:
Dec. 06, 2005
Franciscus Bernardus Maria Van Bilsen, Eindhoven, NL;
Jacobus Burghoorn, Haelen, NL;
Richard Johannes Franciscus Van Haren, Veldhoven, NL;
Paul Christiaan Hinnen, Veldhoven, NL;
Hermanus Gerardus Van Horssen, Maasbracht, NL;
Jeroen Huijbregtse, Breda, NL;
Andre Bernardus Jeunink, Bergeyk, NL;
Henry Megens, Eindhoven, NL;
Ramon Navarro Y Koren, Veldhoven, NL;
Hoite Pieter Theodoor Tolsma, Eindhoven, NL;
Hubertus Johannes Gertrudus Simons, Venlo, NL;
Johny Rutger Schuurhuis, Eindhoven, NL;
Sicco Ian Schets, Eindhoven, NL;
Brian Young Bok Lee, Seoul, KR;
Allan Reuben Dunbar, London, GB;
Franciscus Bernardus Maria Van Bilsen, Eindhoven, NL;
Jacobus Burghoorn, Haelen, NL;
Richard Johannes Franciscus Van Haren, Veldhoven, NL;
Paul Christiaan Hinnen, Veldhoven, NL;
Hermanus Gerardus Van Horssen, Maasbracht, NL;
Jeroen Huijbregtse, Breda, NL;
Andre Bernardus Jeunink, Bergeyk, NL;
Henry Megens, Eindhoven, NL;
Ramon Navarro Y Koren, Veldhoven, NL;
Hoite Pieter Theodoor Tolsma, Eindhoven, NL;
Hubertus Johannes Gertrudus Simons, Venlo, NL;
Johny Rutger Schuurhuis, Eindhoven, NL;
Sicco Ian Schets, Eindhoven, NL;
Brian Young Bok Lee, Seoul, KR;
Allan Reuben Dunbar, London, GB;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.