This inventor holds 6 USPTO granted patents. Top assignee: Asml Netherlands B.v.. Active years: 2007-2012.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2007-2012
Title: Innovator Spotlight: Johny Rutger Schuurhuis - Pioneering Inventor from Eindhoven
Introduction:
Johny Rutger Schuurhuis is a distinguished inventor hailing from Eindhoven, Netherlands, renowned for his remarkable contributions to the field of lithographic systems. With an impressive portfolio of 6 patents to his name, Schuurhuis has consistently pushed the boundaries of innovation in alignment systems for lithographic apparatus.
Latest Patents:
Schuurhuis's latest patents showcase his expertise in developing cutting-edge alignment systems and methods for lithographic systems. One of his groundbreaking inventions includes an alignment system equipped with a detection system and a position determining unit, designed to accurately determine the position of an alignment mark on a workpiece while considering the manufacturing process. These patents demonstrate Schuurhuis's commitment to advancing precision engineering in the realm of lithography.
Career Highlights:
Currently affiliated with ASML Netherlands B.V., a leading technology company specializing in lithography equipment, Schuurhuis has played a pivotal role in shaping the technological landscape of the industry. His innovative solutions have significantly enhanced the efficiency and accuracy of lithographic systems, earning him recognition as a key player in the field.
Collaborations:
Throughout his career, Schuurhuis has collaborated closely with esteemed colleagues such as Franciscus Bernardus Maria Van Bilsen and Jacobus Burghoorn. Together, they have shared insights, expertise, and resources to drive forward groundbreaking projects and achieve remarkable results in the development of advanced lithographic technologies.
Conclusion:
In conclusion, Johny Rutger Schuurhuis emerges as a visionary inventor whose inventive spirit and dedication to excellence have revolutionized the domain of lithographic systems. His pioneering work continues to inspire innovation and drive progress in the field, setting new standards for precision engineering and technological advancement.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
