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For the Inventor, By the Inventor

Venlo, Netherlands

Hubertus Johannes Gertrudus Simons

This inventor holds 25 USPTO granted patents and 1 published patent application and 2 EPO patents, primarily in Lithographic Systems. Top assignee: Asml Netherlands B.v.. Active years: 2005-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hubertus Johannes Gertrudus Simons. Retrieved from https://idiyas.com/inventor/hubertus-johannes-gertrudus-simons

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 25 

% Patents Active = 80.0

 

Average Co-Inventor Count = 5.5

ph-index = 9

Forward Citations = 194(Granted Patents)


Company Filing History:

goldMedal25 out of 5,080 
 
Asml Netherlands B.v.
 patents

Years Active: 2005-2026

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Areas of Expertise:
Inspection
Metrology
Lithographic Processing
Device Manufacturing
Alignment Systems
Pattern Application
Substrate Positioning
Overlay Correction
25 patents (USPTO):Explore Patents
1. 12737430 - Method and apparatus for inspection and metrology (2026-09-15),
2. RE49460 - Inspection method and apparatus and lithographic processing cell (2023-03-13),
3. RE49199 - Inspection method and apparatus and lithographic processing cell (2022-09-05),
4. 11170072 - Method and apparatus for inspection and metrology (2021-11-09),
5. 11061336 - Device manufacturing method (2021-07-13),
6. 9927717 - Inspection method and apparatus, and lithographic apparatus (2018-03-27),
7. 9291916 - Method of applying a pattern to a substrate, device manufacturing method and lithographic apparatus for use in such methods (2016-03-22),
8. 8982347 - Alignment mark deformation estimating method, substrate position predicting method, alignment system and lithographic apparatus (2015-03-17),
9. 8976355 - Method of applying a pattern to a substrate, device manufacturing method and lithographic apparatus for use in such methods (2015-03-10),
10. 8887107 - Inspection method and apparatus and lithographic processing cell (2014-11-11),
11. 8706442 - Alignment system, lithographic system and method (2014-04-22),
12. 8504333 - Method for selecting sample positions on a substrate, method for providing a representation of a model of properties of a substrate, method of providing a representation of the variation of properties of a substrate across the substrate and device manufacturing method (2013-08-06),
13. 8248579 - Lithographic apparatus, device manufacturing method and device for correcting overlay errors between overlapping patterns (2012-08-21),
14. 8237914 - Process, apparatus, and device for determining intra-field correction to correct overlay errors between overlapping patterns (2012-08-07),
15. 8139217 - Alignment systems and methods for lithographic systems (2012-03-20),

Title: Inventor Hubertus Johannes Gertrudus Simons - Pioneering Innovations in Lithographic Technology

Introduction:

Hubertus Johannes Gertrudus Simons, a talented inventor hailing from Venlo, NL, has made significant contributions to the field of lithographic technology. With an impressive portfolio of 24 patents, Simons has been at the forefront of developing groundbreaking methods and apparatuses in the industry.

Latest Patents:

Among his latest patents is an "Inspection method and apparatus and lithographic processing cell." This revolutionary method involves calculating process corrections for a lithographic tool by measuring process defect data on a substrate, fitting a process signature model, and using it to determine the necessary corrections. Simons' innovative approach demonstrates his keen insight and expertise in lithographic processes.

Career Highlights:

Simons is currently associated with ASML Netherlands B.V., a renowned company in the field of semiconductor equipment manufacturing. His impactful work at ASML has helped drive advancements in lithographic processing, establishing him as a key figure in the industry.

Collaborations:

Simons has collaborated with notable peers such as Everhardus Cornelis Mos and Richard Johannes Franciscus Van Haren. Together, they have shared knowledge, expertise, and insights to further elevate the standards of innovation in lithographic technology.

Conclusion:

Inventor Hubertus Johannes Gertrudus Simons' dedication to pushing the boundaries of lithographic technology through his inventive solutions underscores his commitment to driving progress in the industry. His inventive spirit and collaborative efforts continue to shape the future of lithographic processing, leaving a lasting impact on the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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