The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 11, 2014

Filed:

Aug. 09, 2013
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Everhardus Cornelis Mos, Best, NL;

Hubertus Johannes Gertrudus Simons, Venlo, NL;

Peter Ten Berge, Eindhoven, NL;

Nicole Schoumans, 's-Hertogenbosch, NL;

Michael Kubis, Düsseldorf, DE;

Paul Cornelis Hubertus Aben, Eindhoven, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01); G03F 1/36 (2012.01);
U.S. Cl.
CPC ...
G06F 17/5081 (2013.01); G03F 1/36 (2013.01);
Abstract

A method of calculating process corrections for a lithographic tool, and associated apparatuses. The method comprises measuring process defect data on a substrate that has been previously exposed using the lithographic tool; fitting a process signature model to the measured process defect data, so as to obtain a model of the process signature for the lithographic tool; and using the process signature model to calculate the process corrections for the lithographic tool.


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