The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 13, 2021
Filed:
Mar. 28, 2018
Asml Netherlands B.v., Veldhoven, NL;
Hubertus Johannes Gertrudus Simons, Venlo, NL;
Everhardus Cornelis Mos, Best, NL;
Xiuhong Wei, Eindhoven, NL;
Reza Mahmoodi Baram, Veldhoven, NL;
Hadi Yagubizade, Eindhoven, NL;
Yichen Zhang, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A device manufacturing method includes: exposing a first substrate using a lithographic apparatus to form a patterned layer having first features; processing the first substrate to transfer the first features into the first substrate; determining displacements of the first features from their nominal positions in the first substrate; determining a correction to at least partly compensate for the displacements; and exposing a second substrate using a lithographic apparatus to form a patterned layer having the first features, wherein the correction is applied for or during the exposing the second substrate.