The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 22, 2014
Filed:
Jul. 03, 2009
Everhardus Cornelis Mos, Best, NL;
Henricus Johannes Lambertus Megens, Waalre, NL;
Maurits Van Der Schaar, Eindhoven, NL;
Hubertus Johannes Gertrudus Simons, Venlo, NL;
Scott Anderson Middlebrooks, Duizel, NL;
Everhardus Cornelis Mos, Best, NL;
Henricus Johannes Lambertus Megens, Waalre, NL;
Maurits Van Der Schaar, Eindhoven, NL;
Hubertus Johannes Gertrudus Simons, Venlo, NL;
Scott Anderson Middlebrooks, Duizel, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic system includes a lithographic apparatus comprising a projection system which projects a patterned radiation beam onto a target portion of a substrate and an alignment system which measures the position of a feature of the pattern on the substrate at a number of locations over the substrate. A controller compares the measured positions with points on a grid of values and extrapolates values for intermediate positions on the substrate based on values of corresponding intermediate points on the grid, so as to provide an indication of the intermediate positions on the substrate and their displacements relative to the grid. The grid is based on at least one orthogonal basis function, the measurement on the substrate being performed at positions corresponding to the root values of the at least one orthogonal basis function.