The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 18, 2009
Filed:
May. 01, 2008
Richard Alexander George, Son en Breugel, NL;
Cheng-qun Gui, Best, NL;
Pieter Willem Herman DE Jager, Rotterdam, NL;
Robbert Edgar Van Leeuwen, Eindhoven, NL;
Jacobus Burghoorn, Haelen, NL;
Richard Alexander George, Son en Breugel, NL;
Cheng-Qun Gui, Best, NL;
Pieter Willem Herman de Jager, Rotterdam, NL;
Robbert Edgar Van Leeuwen, Eindhoven, NL;
Jacobus Burghoorn, Haelen, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus is provided. The lithographic apparatus includes a radiation source configured to provide radiation, an array of optical light engines, and a substrate table that supports a substrate. Each of the optical light engines includes an array of individually controllable elements arranged and constructed to receive and to pattern the radiation and projection optics configured to receive the patterned radiation and to project the patterned radiation onto the substrate. The substrate table is arranged and constructed to move relative to the array of optical light engines during exposure of the substrate to the patterned radiation.