Asml Netherlands B.v.

Asml Holding N.v.

Cheng-Qun Gui

Pieter Willem Herman De Jager

Henricus Wilhelmus Maria Van Buel

Arno Jan Bleeker

Robert D Harned

Robbert Edgar Van Leeuwen

Richard Alexander George

Arie Jeffrey Den Boef

Maurits Van Der Schaar

Johannes Onvlee

Jacobus Burghoorn

Fransiscus Godefridus Casper Bijnen

Johan Christiaan Gerard Hoefnagels

Eduard Hoeberichts

Vadim Yevgenyevich Banine

Joeri Lof

Erwin Rinaldo Meinders

Jozef Petrus Henricus Benschop

Erwin John Van Zwet

Peter Theodorus Maria Giesen

Rudy Jan Maria Pellens

Nora-Jean Harned

Keith Frank Best

Nikolay Nikolaevich Iosad

Peter Spit

Joost Sytsma

Paulus Wilhelmus Leonardus Van Dijk

Wilhelmus Johannes Maria De Laat

Gustaaf Willem Van Der Feltz

Patrick De Jager

Joannes Theodoor De Smit

Harmen Klaas Van Der Schoot

Mária Péter

Peter Ten Berge

Robert-Han Munnig Schmidt

Joseph Consolini

Alexander M Friz

Keith Best

Remi Daniel Marie Edart

Enno Van Den Brink

Jacob Fredrik Friso Klinkhamer

Oleg Voznyi

Marcus Theodoor Wilhelmus Van Der Heijden

Lev Sakin

David Christopher Ockwell

Geoffrey Norman Phillipps

Irina I Pozhinskaya

Pascale Anne Maury

Noreen Harned

Alex De Vries

Budiman Sutedja

Jacobus Burghoom

Henricus Wilheimus Maria Van Buel

Henricus Van Buel

Gabriel Nicolaas Martinus Maria Van Der Voort

Robert-Han Munning Schmidt

A method of obtaining information indicative of the topography of a surface of a flexible substrate, the method including directing a beam of radiation at the surface of the flexible substrate; and detecting changes in intensity distribution, or angle of reflection, of the beam of radiation after the beam of radiation has been reflected from the surface of the substrate to obtain information indicative of the topography of the surface of the flexible substrate.

Lithographic apparatus and method

In an embodiment, a lithographic apparatus is disclosed that includes a modulator configured to expose an exposure area of the substrate to a plurality of beams modulated according to a desired pattern and a projection system configured to project the modulated beams onto the substrate. The modulator may be moveable with respect the exposure area and/or the projection system may have an array of lenses to receive the plurality of beams, the array of lenses moveable with respect to the exposure area.

Lithographic apparatus, programmable patterning device and lithographic method

A lithographic method, among things is disclosed. The method includes using information at least indicative of a desired shape or size of a constituent part of a device to implement the desired shape or size of the constituent part of the device, the desired shape or size being related to a measured property of a layer of material in which the constituent part of the device is to be created, at least a part of the implementation comprising determining a configuration of a plurality of individually controllable elements that would be necessary to create in a radiation beam a pattern which is sufficient to implement the desired shape or size of the constituent part of the device when creating the constituent part of the device.

A system and method are used to form features on a substrate. The system and method include using a first array including individually controllable elements that selectively pattern a beam of radiation, a second array including sets of lenses and apertures stops that form an image from a respective one of the individually controllable elements in a first plane, a third array including lenses that form an image from a respective one of the second array in a second plane, and a substrate table that holds a substrate in the second plane, such that the substrate receives the image from the respective one of the second array. A same spacing is formed between elements in the first, second, and third arrays.

Lithographic apparatus and device manufacturing method

A lithography apparatus includes a projection system configured to project a radiation beam onto a substrate, a detector configured to inspect the substrate, and a substrate table configured to support the substrate and move the substrate relative to the projection system and the detector. The detector is arranged to inspect a portion of the substrate while the substrate is moved and before the portion is exposed to the radiation beam.

According to a first aspect of the invention, there is provided a lithographic method of providing an alignment mark on a layer provided on a substrate, the method including providing the alignment mark on an area of the layer which is oriented within a certain range of angles with respect to a surface of the substrate on which the layer is provided.

A lithographic apparatus and method in which a system is used to emit a patterned beam. The patterned beam is projected onto a target portion of the surface of a substrate supported on a substrate support. The target portion has predetermined spatial characteristics relative to the substrate table that are appropriate for a desired exposure pattern on the surface of the substrate. The temperature of the substrate is measured, and the dimensional response of the substrate to the measured temperature is calculated. The spatial characteristics of the target portion relative to the substrate table are adjusted to compensate for the calculated dimensional response.

A lithographic apparatus comprises an illumination system for supplying a beam of radiation, a patterning arrangement incorporating an array of individually controllable elements for imparting a pattern to the beam cross-section, a substrate table for supporting a substrate, and a projection system incorporating a microlens array for projecting the beam onto a target portion of the substrate. An error compensator is provided for supplying error correction values for compensating for the effect of positional errors in the microlens array, and a grey scale modulator is provided for supplying drive signals to controllable elements of the patterning arrangement in dependence on the error correction values in order to compensate for the effect of positional errors in the microlens array by varying the intensity of some parts of the pattern relative to other parts of the pattern.

A lithographic method includes providing particles in dry form on a substrate, or on material provided on the substrate, irradiating one or more of the particles with a dose of radiation, the dose of radiation being sufficient to ensure that at least one particle of the one or more particles is bonded to the substrate, or to the material provided on the substrate, and removing particles from the substrate, or from material provided on the substrate, that have not been bonded to the substrate, or to the material provided on the substrate.

A carrier substrate is provided with a layer of PDMS and curing agent on one side of the carrier substrate. The PDMS and curing agent can be arranged to receive and adhere to a lithographic substrate. The carrier substrate can be dimensioned such that the combined carrier substrate and lithographic substrate may be handled by a conventional lithographic apparatus.

Lithographic method and carrier substrate

Provided is a method and system for facilitating use of a plurality of individually controllable elements to modulate the intensity of radiation received at each focusing element of an array of focusing elements to control the intensity of the radiation in the areas on the substrate onto which the focusing elements direct the radiation.

A lithographic method includes patterning a beam of radiation with a patterning device. The patterning device includes at least two image patterning portions and at least two metrology mark patterning portions. The method also includes projecting at least two image portions of the patterned beam of radiation sequentially onto target portions of a substrate such that the projected image portions are substantially adjacent to each other on the substrate and collectively form a composite image on the substrate. The method also includes projecting a metrology mark onto the substrate outside of the area of the composite image at the same time as projecting each of at least two of the image portions, and measuring the alignment of the metrology marks to determine the relative positions of the at least two image portions.

Lithographic method and patterning device

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Cheng-Qun Gui