The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 05, 2016

Filed:

Nov. 03, 2008
Applicants:

Wilhelmus Johannes Maria DE Laat, Heeswijk-Dinther, NL;

Cheng-qun Gui, Best, NL;

Peter Theodorus Maria Giesen, Geldrop, NL;

Marcus Theodoor Wilhelmus Van Der Heijden, Dilsen-Stokkem, BE;

Erwin Rinaldo Meinders, Veldhoven, NL;

Mária Péter, Eindhoven, NL;

Inventors:

Wilhelmus Johannes Maria De Laat, Heeswijk-Dinther, NL;

Cheng-Qun Gui, Best, NL;

Peter Theodorus Maria Giesen, Geldrop, NL;

Marcus Theodoor Wilhelmus Van Der Heijden, Dilsen-Stokkem, BE;

Erwin Rinaldo Meinders, Veldhoven, NL;

Mária Péter, Eindhoven, NL;

Assignee:

ASML NETHERLANDS B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G01B 11/30 (2006.01); G01N 21/956 (2006.01);
U.S. Cl.
CPC ...
G01B 11/306 (2013.01); G03F 7/703 (2013.01); G03F 7/7085 (2013.01); G03F 7/70783 (2013.01); G01N 2021/95676 (2013.01);
Abstract

A method of obtaining information indicative of the topography of a surface of a flexible substrate, the method including directing a beam of radiation at the surface of the flexible substrate; and detecting changes in intensity distribution, or angle of reflection, of the beam of radiation after the beam of radiation has been reflected from the surface of the substrate to obtain information indicative of the topography of the surface of the flexible substrate.


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