The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 05, 2013
Filed:
Feb. 26, 2009
Keith Frank Best, San Jose, CA (US);
Henricus Wilhelmus Maria Van Buel, 's-Hertogenbosch, NL;
Cheng-qun Gui, Best, NL;
Johannes Onvlee, 's-Hertogenbosch, NL;
Rudy Jan Maria Pellens, Overpelt, BE;
Remi Daniel Marie Edart, Veldhoven, NL;
Oleg Viacheslavovich Voznyi, Eindhoven, NL;
Pascale Anne Maury, Veldhoven, NL;
Keith Frank Best, San Jose, CA (US);
Henricus Wilhelmus Maria Van Buel, 's-Hertogenbosch, NL;
Cheng-Qun Gui, Best, NL;
Johannes Onvlee, 's-Hertogenbosch, NL;
Rudy Jan Maria Pellens, Overpelt, BE;
Remi Daniel Marie Edart, Veldhoven, NL;
Oleg Viacheslavovich Voznyi, Eindhoven, NL;
Pascale Anne Maury, Veldhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
According to a first aspect of the invention, there is provided a lithographic method of providing an alignment mark on a layer provided on a substrate, the method including providing the alignment mark on an area of the layer which is oriented within a certain range of angles with respect to a surface of the substrate on which the layer is provided.