The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 17, 2013
Filed:
Dec. 13, 2010
Johannes Jacobus Matheus Baselmans, Oirschot, NL;
Francis Fahrni, Eindhoven, NL;
Gerardus Johannes Joseph Keijsers, Venlo, NL;
Heine Melle Mulder, Veldhoven, NL;
Willem Richard Pongers, Veldhoven, NL;
Joost Cyrillus Lambert Hageman, Eindhoven, NL;
Mattheus Johannes Van Bruggen, Rijswijk, NL;
Johannes Franciscus Roosekrans, Houthalen, BE;
David James Butler, Veldhoven, NL;
Patrick Marcel Maria Thomassen, Eindhoven, NL;
Gabriela Vesselinova Paeva, Eindhoven, NL;
Johannes Jacobus Matheus Baselmans, Oirschot, NL;
Francis Fahrni, Eindhoven, NL;
Gerardus Johannes Joseph Keijsers, Venlo, NL;
Heine Melle Mulder, Veldhoven, NL;
Willem Richard Pongers, Veldhoven, NL;
Joost Cyrillus Lambert Hageman, Eindhoven, NL;
Mattheus Johannes Van Bruggen, Rijswijk, NL;
Johannes Franciscus Roosekrans, Houthalen, BE;
David James Butler, Veldhoven, NL;
Patrick Marcel Maria Thomassen, Eindhoven, NL;
Gabriela Vesselinova Paeva, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus includes an illumination system configured to provide a first beam of radiation, which forms a first mask illumination region, and configured to substantially simultaneously provide a second beam of radiation, which forms a second mask illumination region. The first and second illumination regions being configured to substantially simultaneously illuminate a same mask. The lithographic apparatus also includes a projection system configured to project the first radiation beam such that it forms a first substrate illumination region and configured to simultaneously project the second radiation beam such that it forms a second substrate illumination region.