The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 30, 2013
Filed:
Jun. 24, 2010
Applicants:
Bert Jan Claessens, Spalbeek, BE;
Paul Van Der Veen, Waalre, NL;
Herman Philip Godfried, Amsterdam, NL;
Inventors:
Bert Jan Claessens, Spalbeek, BE;
Paul Van Der Veen, Waalre, NL;
Herman Philip Godfried, Amsterdam, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 27/72 (2006.01); G03B 27/52 (2006.01);
U.S. Cl.
CPC ...
Abstract
A lithographic apparatus including a radiation beam monitoring apparatus, the radiation beam monitoring apparatus including an optical element configured to generate a diffraction pattern, and an imaging detector located after the optical element and not in a focal plane of the optical element such that the imaging detector is capable of detecting a mixture of spatial coherence and divergence of the radiation beam.